Riber S.A., a provider of molecular beam epitaxy (MBE) systems and evaporation sources based in Berzong, France, announced that its MBE 8000 production platform has obtained final certification from a leading epitaxial wafer manufacturer in the United States.
It is reported that the productivity of MBE 8000 is twice that of existing products on the market, and it also has excellent performance. MBE technology is flexible, and MBE 8000 can meet the growing market of all compound semiconductors, including vertical cavity surface emitting lasers (VCSELs), transistors, sensors, etc. These markets require high levels of performance in terms of uniformity, reproducibility, and stability.
The system is capable of batch growing 8 150mm (6 inches) or 4 200mm (8 inches) wafers, with a production capacity 50% higher than existing products. Due to the same unit design, system geometry, and process control, process transfer can be ensured in the shortest possible time, and Riber machines are easy to operate.
The final identification step validated the performance of MBE 8000 in terms of process, robustness, stability, ergonomics, and control. For example, measuring 0.8-8 on VCSEL type structures μ When m particles are present, the defect density after 30 runs is less than 50 particles/cm2.